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news & events | application notes | about us | contact us +44(0)1628 566241 [email protected] !-- home semiconductor materials antimonides evaporation materials gallium nitride germanium wafers high purity metals molybdenum components silicon wafers sputtering targets testing and analysis atomic force microscopes electrical characterisation for afm afm probes leak testing hand abrasion tester mechanical testers surface profilers tribometers thin film metrology thin film processing physical vapour deposition (pvd) plasma enhanced chemical vapour deposition pecvd plasma enhanced atomic layer deposition peald plasma etching icp-rie and rie cluster configurations process monitoring !-- photonic materials scintillator materials silicon blocks x-ray monochromators optics laser optics garnets !-- infrared optics !-- sapphire non linear crystals !-- dosimetry display filters emishield micromesh optical bonding optical filters shielded windows infrared filters laminated windows gaskets and adhesives conductive ito film and coatings linear polarisers circular polarisers 650 plum contrast enhancement filter contrast enhancement filters light diffusion filters privacy glass & light control film micro fine mesh for shielding anti glare screens menu !-- home semiconductor materials ▾ semiconductor materials home antimonides evaporation materials gallium nitride germanium wafers high purity metals molybdenum components silicon wafers sputtering targets testing and analysis ▾ testing and analysis home atomic force microscopes afm probes electrical characterisation for afm leak testing hand abrasion tester mechanical testers surface profilers tribometers thin film metrology thin film processing ▾ thin film processing home physical vapour deposition (pvd) plasma enhanced chemical vapour deposition pecvd plasma enhanced atomic layer deposition peald plasma etching icp-rie and rie cluster configurations photonic materials ▾ photonic materials home scintillator materials silicon blocks x-ray monochromators optics ▾ optics home garnets !-- laser optics sapphire dosimetry display filters ▾ display filters home emishield micromesh optical bonding optical filters shielded windows infrared filters laminated windows gaskets and adhesives ito film and coatings linear polarisers circular polarisers 650 plum contrast enhancement filter contrast enhancement filters light diffusion filters privacy glass & light control films micro fine mesh for shielding anti glare screens news & events application notes about us contact us welcome to mi-net technology ltd !-- mi-net technology ltd is a scientific distributor of advanced materials, components and instruments for research and industry.formed in 1986 mi-net has enjoyed nearly 30 successful years and currently represents a multitude of leading edge suppliers. !-- welcome to mi-net technology ltd mi-net technology is a scientific distributor of advanced materials, components and instruments for research and industry. formed in 1986 mi-net has enjoyed over 30 successful years and currently represents a multitude of leading edge suppliers. read more about mi-net technology... !-- featured application note measurement of thick films from 1 to 25µm - the accessible film thickness range in spectroscopic ellipsometry using sentech senresearch 4.0 ellipsometer family is extremely wide. this application note will discuss the film thickness range from 1.0 μm to 14 μm of a photoresist film and a sio2 film of 25 μm thickness.. read more... read more notes likes this... !-- news & events resiscope featured in new cafm book! - we are pleased to announce that the cs instruments resiscope module for advanced conductive measurements with atomic force microscopy will be featured in a new publication by wiley-vch. the resiscope is featured in chapter xii of conductive atomic force microscopy, application in nanomaterials. read more... !-- subscribe to our newsletter all our latest news and application notes delivered to you once monthly. * indicates required !-- email address * semiconductor materials advanced semiconductor materials in bulk and wafer form. small and large volumes available. testing and analysis high quality portfolio of instruments for testing and analysis. suitable for lab based research and quality control. in-situ and desktop solutions available.for sample testing and demonstrations. thin film processing extensive range of instruments for thin film processing. retrofit and upgrade of existing equipment also available. afm trade in deal trade in your old afm of any brand working or new and receive money of a brand new high specification afm from cs instruments. click here for more information. photonic materials photonic materials for use in applications requiring scintillation or x-ray monochromation. materials available in crystal, plastic, fibre form plus others. optics high performance range of optics such as infrared, laser and sapphire optics. catalogue or bespoke optics available. dosimetry grade padc dosimetry grade padc also commonly known as cr-39. supplied in sheet or detector format. small and large volumes. display filters high quality competitively priced technical plastics, glass and laminated materials. advanced emc and rfi shielding. recently featured application notes recently featured application notes sio2 etching selective to photoresist mask this application note presents a successful sio2 icp-rie process result with a high selectivity to photoresist (pr) mask. read more about this application note... high selectivity sinx etching by sentech si 500 icp-rie etching system this application note presents a successful icp process result with a moderate etch rate and a proper selectivity to photoresist mask. read more about this application note... now the world's leading mechanical tester in this application note it will be explained how the nanovea micro module tester has been designed to offer the world's leading instrumented indentation and scratch testing. now capable of testing from loads of 0.03n up to 200n or even 400n on one tool combined with a highly accurate and repeatable stage. load data is collected from load cells while depth is measured from a high precision capacitor depth sensor. high structural stiffness of the system ensures the instrument is as reliable and as accurate at low loads as it is at high loads. read more about this application note... surface roughness of concrete using 3d profilometry in this application, the nanovea jr25 (portable profilometer) is used to measure the surface of a concrete sample. several surface parameters will automatically be calculated including the most common, sa (average surface roughness). read more about this application note... solar cell inspection using 3d profilometry in this application note, the nanovea hs1000 (we have shown the newer hs2000 below) is used to measure two different types of solar material (photovoltaic material and glass) and calculate their respective surface roughness, surface features and wafer bow. the shape of trace lines on the photovoltaic material will also be measured. read more about this application note... deposition of multilayer by thermal and plasma enhanced ald in this application note by sentech instruments thermal ald-al 2 o 3 and peald-sio 2 films were deposited alternately in the sentech ald system si ald ll. the deposition of the multilayer is performed automatically using a recipe run. in total 53 layers with different thicknesses between 9 and 70 nm were deposited on 4-inch silicon wafer (si-wafer). read more about this application note... nano scratch testing of thin film on glass substrate we must simulate the process of scratching in a controlled and monitored manner to observe sample behaviour effects. in this application note, the nanovea mechanical tester in its nano scratch testing mode is used to measure the load required to cause failure of two different commonly used thin film material

URL analysis for mi-net.co.uk

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http://www.mi-net.co.uk/semiconductor-materials.php
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